Pfeiffer Vacuum+Fab Solutions at SEMICON Europa 2025

02.01.2026

Pfeiffer Vacuum+Fab Solutions – a member of the global Busch Group – presented its comprehensive portfolio for the semiconductor industry at SEMICON Europa 2025, which took place from November 18 to 21 in Munich, Germany.

Photo: The highlight of the Pfeiffer booth at SEMICON Europa 2025 was the launch of ARGOS, the new predictive maintenance service solution from Pfeiffer Vacuum+Fab Solutions.
Source: Busch Group  

Pfeiffer offers high-quality vacuum solutions for the entire semiconductor fab – from cleanroom to exhaust – optimizing manufacturing processes with precision, reliability, and efficiency. Visitors came by the booth to discuss the technologies on display as well as developing trends in the semiconductor industry with the experts. Of particular interest was ARGOS, the new predictive maintenance service solution that Pfeiffer introduced for the first time during the trade show.

Reduced downtime thanks to digital semiconductor services

ARGOS is an on-site machine learning and analytics service for semiconductor fabs that combines production-grade machine learning with decades of vacuum pump and abatement expertise. It converts operational data into prioritized, risk-based actions to increase uptime, reduce total cost-of-ownership, and stabilize yield. This vendor-independent solution operates entirely on the premises, keeping sensitive fab data under customer control.

Vacuum pumps for the semiconductor industry

The UltiDry multi-stage roots vacuum pump was another highlight at this year’s booth. Its oil-free multi-stage compression ensures clean, dry vacuum without contamination, which is crucial for the sensitive processes in the semiconductor industry. With enhanced powder management and the ability to handle high inlet flow and withstand corrosive gases, the UltiDry is well suited for harsh applications. A full-size model was showcased in combination with ARGOS to allow visitors to see how the two pieces of hardware are connected.

Waste gas treatment system

Pfeiffer also exhibited the CT-TW-H, a high-temperature thermal-wet gas abatement system. The CT-TW-H combines the wide process coverage of flame abatement with the fuel-free aspects of plasma abatement. The systems feature lower operating costs and secondary emissions and can destroy the molecular process gas NF3 at class-leading levels with extremely low NOx emissions. This provides a sustainable solution with a minimal carbon footprint for CVD and metal-etch processes. 

A look inside a semiconductor fab

As well as the different technologies presented, a 3D-printed model of a semiconductor fab displayed the setup of a manufacturing facility in a tangible way – from the cleanroom to the sub-fab. Alongside an interactive touch display showing a digital fab, visitors to the booth could explore where each of the various technologies from Pfeiffer are integrated throughout the facility.

Source: Busch Group